Publicações

Influence of Substrate Bias Voltage on the Physical, Electrical and Dielectric Properties of Rf Magnetron Sputtered Tio 2 Films

AuthID
P-008-2Z3

Author(s)

Kondaiah, P

Sekhar, MC

Chandra, SVJ

Martins, R

Uthanna, S

Elangovan, E

Tipo de Documento

Proceedings Paper

Year published

2012

Publicado

in IOP Conference Series: Materials Science and Engineering, ISSN: 1757-8981

Volume: 30, Número: 1, Páginas: 012005

Conference

European Materials Research Society (Emrs) Fall Meeting 2011 Symposium K: Solution-Derived Electronic-Oxide Films Nanostructures and Patterning, from Materials to Devices, Date: 19 September 2011 through 23 September 2011, Location: Warsaw

Indexing

Scopus^®

Crossref^®

Google Scholar^®

Metadata
Fontes

Publication Identifiers

DOI: 10.1088/1757-899x/30/1/012005

SCOPUS: 2-s2.0-84858213569

Source Identifiers

ISSN: 1757-8981

Export Publication Metadata

Lista Marked

Adicionar à lista Marked

Info

At this moment we don't have any links to full text documens.

Influence of Substrate Bias Voltage on the Physical, Electrical and Dielectric Properties of Rf Magnetron Sputtered Tio 2 Films

Links Úteis

Ajuda

Autenticação Federada (Clique na imagem)

Influence of Substrate Bias Voltage on the Physical, Electrical and Dielectric Properties of Rf Magnetron Sputtered Tio 2 Films

Links Úteis

Ajuda