Post-Deposition Annealing and Hydrogenation of Hot-Wire Amorphous and Microcrystalline Silicon Films

AuthID
P-001-C4S
3
Author(s)
6
Editor(es)
Collins, RW; Fauchet, PM; Shimizu, I; Vial, JC; Shimada, T; Alivisatos, AP
Tipo de Documento
Proceedings Paper
Year published
1997
Publicado
in ADVANCES IN MICROCRYSTALLINE AND NANOCRYSTALLINE SEMICONDUCTORS - 1996 in Materials Research Society Symposium Proceedings, ISSN: 0272-9172
Volume: 452, Páginas: 779-784 (6)
Conference
Symposium Q on Advances in Microcrystalline and Nanocrystalline Semiconductors - 1996, at the 1996 Mrs Fall Meeting, Date: DEC 02-06, 1996, Location: BOSTON, MA, Patrocinadores: Mat Res Soc, Asahi Glass Co Ltd, Hitachi Europe Ltd, Hitachi Ltd, Kaneka Corp, Mitsui Toatsu Chem Incorp, Sanyo Elect Co Ltd, Sharp Corp, Xerox PARC
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0030714884
Wos: WOS:A1997BH46M00119
Source Identifiers
ISSN: 0272-9172
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