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Deposition of Silicon Nitride Thin Films by Hot-Wire Cvd at 100 °C and 250 °C
AuthID
P-00H-EGJ
6
Author(s)
Alpuim, P
·
Gonçalves, L
·
Marins, E
·
Viseu, T
·
Ferdov, S
·
Bourée, J
Document Type
Article
Year published
2009
Published
in
Thin Solid Films,
ISSN: 0040-6090
Volume: 517, Issue: 12, Pages: 3503-3506
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DOI
:
10.1016/j.tsf.2009.01.077
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ISSN
: 0040-6090
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