Annealing Kinetics of A-Si:h Deposited by Concentric-Electrode Rf Glow Discharge at Room Temperature

AuthID
P-00H-MCE
8
Author(s)
Chan, KK
·
Blum, JM
·
Arienzo, M
·
Monteiro, PA
·
Wyrsh, N
Tipo de Documento
Article
Year published
1993
Publicado
in J. Appl. Phys. - Journal of Applied Physics, ISSN: 0021-8979
Volume: 73, Número: 4, Páginas: 1826
Indexing
Publication Identifiers
Source Identifiers
ISSN: 0021-8979
Export Publication Metadata
Info
At this moment we don't have any links to full text documens.