Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

AuthID
 P-00N-QTJ
18
Author(s)
Zhang, JH
·
Xiao, C
·
Strane, JW
·
Hall, L
·
Chen, J
·
Stoll, DC
·
Wallner, J
·
Zhuang, H
·
Kleemeier, W
·
Goldberg, C
·
Moon, Y
·
Truong, C
·
Sudijono, J
·
Chen, X
·
Sampson, R
Tipo de Documento
Proceedings Paper
Year published
2012
Publicado
in Materials Research Society Symposium Proceedings, ISSN: 0272-9172
Volume: 1335, Páginas: 35-40
Conference
2011 Mrs Spring Meeting, Date: 25 April 2011 through 29 April 2011, Location: San Francisco, CA
Indexing
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Publication Identifiers
SCOPUS: 2-s2.0-84055193773
Source Identifiers
ISSN: 0272-9172
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