Mechanical and Piezoresistive Properties of Thin Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition and Hot-Wire Chemical Vapor Deposition at Low Substrate Temperatures

AuthID
 P-002-7YZ
6
Author(s)
Gualdino, A
·
Lemke, B
·
Paul, O
·
·
Tipo de Documento
Article
Year published
2012
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 112, Número: 2, Páginas: 024906 (8)
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-84865513846
Wos: WOS:000308424500143
Source Identifiers
ISSN: 0021-8979
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service