Theory of the Thermal Stability of Silicon Vacancies and Interstitials in 4H-Sic

AuthID
 P-00T-HK0
1
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Tipo de Documento
Article
Year published
2021
Publicado
in CRYSTALS, ISSN: 2073-4352
Volume: 11, Número: 2, Páginas: 1-19 (19)
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Publication Identifiers
SCOPUS: 2-s2.0-85101045818
Wos: WOS:000622467100001
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ISSN: 2073-4352
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