Ternary Algan Alloys with High Al Content and Enhanced Compositional Homogeneity Grown by Plasma-Assisted Molecular Beam Epitaxy

AuthID
P-002-THH
Tipo de Documento
Article
Year published
2011
Publicado
in JAPANESE JOURNAL OF APPLIED PHYSICS, ISSN: 0021-4922
Volume: 50, Número: 3, Páginas: 031001 (7)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-79953112071
Wos: WOS:000288649800012
Source Identifiers
ISSN: 0021-4922
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