Xrd Analysis of Strained Ge-Sige Heterostructures on Relaxed Sige Graded Buffers Grown by Hybrid Epitaxy on Si(001) Substrates

AuthID
P-000-02Y
7
Author(s)
Morris, RJH
·
Mironov, OA
·
Parker, EHC
Tipo de Documento
Article
Year published
2005
Publicado
in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, ISSN: 0921-5107
Volume: 124, Número: SUPPL., Páginas: 123-126 (4)
Conference
Symposium on Materials Science and Device Issues for Future Si-Based Technologies Held at the 2005 Emrs Meeting, Date: MAY 31-JUN 03, 2005, Location: Strasbourg, FRANCE, Patrocinadores: European Mat Res Soc
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-27944476985
Wos: WOS:000233895800019
Source Identifiers
ISSN: 0921-5107
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