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Manuel Armando Oliveira Pereira dos Santos
AuthID:
R-000-A1H
Publications
Confirmed
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Document Source:
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Document Type:
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Article (27)
Proceedings Paper (5)
Note (1)
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Confirmed Publications: 33
11
TITLE:
Residual stress effects on Raman spectra of RuO2 thin films
AUTHORS:
Meng, LJ
;
Silva, R
; Cui, HN;
Teixeira, V
;
dos Santos, MP
;
PUBLISHED:
2005
,
SOURCE:
7th International Conference onResidual Strsses (ICRS-7)
in
RESIDUAL STRESSES VII, PROCEEDINGS,
VOLUME:
490-491
INDEXED IN:
Scopus
WOS
IN MY:
ORCID
|
ResearcherID
12
TITLE:
Raman spectroscopy analysis of magnetron sputtered RuO2 thin films
Full Text
AUTHORS:
Meng, LJ
;
Teixeira, V
;
dos Santos, MP
;
PUBLISHED:
2003
,
SOURCE:
4th International Conference on Coatings on Glass
in
THIN SOLID FILMS,
VOLUME:
442,
ISSUE:
1-2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
13
TITLE:
The calculation of the optical constants of indium-tin-oxide films
AUTHORS:
Meng, LJ
; Placido, F; Teixeira, V;
dos Santos, MP
;
PUBLISHED:
2003
,
SOURCE:
9th International Conference on Enhancement and Promotion of Computational Methods in Engineering and Science
in
COMPUTATIONAL METHODS IN ENGINEERING AND SCIENCE, PROCEEDINGS
INDEXED IN:
WOS
IN MY:
ORCID
|
ResearcherID
14
TITLE:
Study of ZrO2/Al2O3 multilayers
Full Text
AUTHORS:
Gao, PT;
Meng, LJ
;
dos Santos, MP
;
Teixeira, V
;
Andritschky, M
;
PUBLISHED:
2002
,
SOURCE:
4th Iberian Vacuum Meeting (IVM-4)
in
VACUUM,
VOLUME:
64,
ISSUE:
3-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
15
TITLE:
Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering
Full Text
AUTHORS:
Gao, PT;
Meng, LJ
;
dos Santos, MP
;
Teixeira, V
;
Andritschky, M
;
PUBLISHED:
2001
,
SOURCE:
APPLIED SURFACE SCIENCE,
VOLUME:
173,
ISSUE:
1-2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
16
TITLE:
A study of residual stress on rf reactively sputtered RuO2 thin films
Full Text
AUTHORS:
Meng, LJ
;
dos Santos, MP
;
PUBLISHED:
2000
,
SOURCE:
International-Union-of-Materials-Research-Societies International Conference on Advanced Materials (IUMRS-ICAM 99)
in
THIN SOLID FILMS,
VOLUME:
375,
ISSUE:
1-2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
17
TITLE:
Characterisation of ZrO2 films prepared by rf reactive sputtering at different O-2 concentrations in the sputtering gases
Full Text
AUTHORS:
Gao, PT;
Meng, LJ
;
dos Santos, MP
;
Teixeira, V
;
Andritschky, M
;
PUBLISHED:
2000
,
SOURCE:
VACUUM,
VOLUME:
56,
ISSUE:
2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
18
TITLE:
Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering
Full Text
AUTHORS:
Gao, PT;
Meng, LJ
;
dos Santos, MP
;
Teixeira, V
;
Andritschky, M
;
PUBLISHED:
2000
,
SOURCE:
27th International Conference on Metallurgical Coatings and Thin Films
in
THIN SOLID FILMS,
VOLUME:
377
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
19
TITLE:
Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering
AUTHORS:
Meng, LJ
;
dos Santos, MP
;
PUBLISHED:
2000
,
SOURCE:
46th National Symposium of the American-Vacuum-Society
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
VOLUME:
18,
ISSUE:
4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
20
TITLE:
Study of ZrO2-Y2O3 films prepared by rf magnetron reactive sputtering
Full Text
AUTHORS:
Gao, PT;
Meng, LJ
;
dos Santos, MP
;
Teixeira, V
;
Andritschky, M
;
PUBLISHED:
2000
,
SOURCE:
27th International Conference on Metallurgical Coatings and Thin Films
in
THIN SOLID FILMS,
VOLUME:
377
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
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