301
TITLE: Porous a/nc-Si : H films produced by HW-CVD as ethanol vapour detector and primary fuel cell  Full Text
AUTHORS: Ferreira, I ; Igreja, R ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 17th European Conference on Solid-State Transducers (Eurosensors XVII) in SENSORS AND ACTUATORS B-CHEMICAL, VOLUME: 103, ISSUE: 1-2
INDEXED IN: Scopus WOS CrossRef
302
TITLE: Properties of a-Si : H intrinsic films produced by HWPA-CVD technique  Full Text
AUTHORS: Ferreira, I ; Aguas, H ; Pereira, L ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: Symposium on Thin Film and Nano-Structured Materials for Photovoltaics in THIN SOLID FILMS, VOLUME: 451
INDEXED IN: Scopus WOS
303
TITLE: Properties of a-Si : H TFTs using silicon carbonitride as dielectric  Full Text
AUTHORS: Lavareda, G ; de Carvalho, CN ; Fortunato, E ; Amaral, A ; Ramos, AR ;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
INDEXED IN: Scopus WOS CrossRef
304
TITLE: Properties of ITO films deposited by plasma enhanced RTE on unheated polymer sheets - dependence on rf electrode distance from substrates  Full Text
AUTHORS: de Carvalho, CN ; Lavareda, G ; Fortunato, E ; Amaral, A ;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
INDEXED IN: Scopus WOS CrossRef
305
TITLE: Role of substrate on the growth process of polycrystalline silicon thin films by low-pressure chemical vapour deposition
AUTHORS: Pereira, L ; Aguas, H ; Raniero, L; Martins, RMS ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
306
TITLE: Role of the rf frequency on the structure and composition of polymorphous silicon films  Full Text
AUTHORS: Aguas, H ; Raniero, L; Pereira, L ; Viana, AS ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
INDEXED IN: Scopus WOS
307
TITLE: Silicon etching in CF(4)/O(2) and SF(6) atmospheres
AUTHORS: Silva, A; Raniero, L; Ferreira, E; Aguas, H ; Pereira, L ; Fortunato, E ; Martins, R;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS
308
TITLE: Spectral response of large area amorphous silicon solar cells
AUTHORS: Raniero, L; Martins, N; Canhola, P; Pereira, S; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: HIGH TEMPERATURE MATERIAL PROCESSES, VOLUME: 8, ISSUE: 2
INDEXED IN: Scopus WOS CrossRef
309
TITLE: Sputtering preparation of silicon nitride thin films for gate dielectric applications
AUTHORS: Pereira, L ; Aguas, H ; Igreja, R ; Martins, RMS ; Nedev, N; Raniero, L; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
310
TITLE: The diphasic nc-Si/a-Si : H thin film with improved medium-range order  Full Text
AUTHORS: Zhang, S; Liao, X; Xu, Y; Martins, R ; Fortunato, E ; Kong, G;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
INDEXED IN: Scopus WOS CrossRef
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