João Pedro Estrela Rodrigues Conde
AuthID: R-000-7DS
261
TITLE: STRUCTURAL AND MAGNETIC-PROPERTIES OF UFE(X)M(12-X) (M=AL, MO AND SI) INTERMETALLIC COMPOUNDS Full Text
AUTHORS: GONCALVES, AP ; Grégoire Bonfait ; ALMEIDA, M ; ESTRELA, P; GODINHO, M ; SPIRLET, JC;
PUBLISHED: 1995, SOURCE: International Conference on Magnetism - ICM 94 (13th IUPAP Triennial Conference on Magnetism) in JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, VOLUME: 140
AUTHORS: GONCALVES, AP ; Grégoire Bonfait ; ALMEIDA, M ; ESTRELA, P; GODINHO, M ; SPIRLET, JC;
PUBLISHED: 1995, SOURCE: International Conference on Magnetism - ICM 94 (13th IUPAP Triennial Conference on Magnetism) in JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, VOLUME: 140
INDEXED IN: 
WOS 
CrossRef
WOS CrossRef262
TITLE: Structural and magnetic properties of UFexM12 - x (M = Al, Mo and Si) intermetallic compounds Full Text
AUTHORS: Goncalves, AP ; Grégoire Bonfait ; Almeida, M ; Estrela, P; Godinho, M ; Spirlet, JC;
PUBLISHED: 1995, SOURCE: Journal of Magnetism and Magnetic Materials, VOLUME: 140-144, ISSUE: PART 2
AUTHORS: Goncalves, AP ; Grégoire Bonfait ; Almeida, M ; Estrela, P; Godinho, M ; Spirlet, JC;
PUBLISHED: 1995, SOURCE: Journal of Magnetism and Magnetic Materials, VOLUME: 140-144, ISSUE: PART 2
INDEXED IN: 
Scopus
Scopus263
TITLE: Low filament temperature deposition of a-Si:H by hot-wire chemical vapor deposition Full Text
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
264
TITLE: Transport and photoluminescence of hydrogenated amorphous silicon–carbon alloys Full Text
AUTHORS: Chu, V; Conde, JP; Jarego, J; Brogueira, P; Rodriguez, J; Barradas, N; Soares, JC;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 5
AUTHORS: Chu, V; Conde, JP; Jarego, J; Brogueira, P; Rodriguez, J; Barradas, N; Soares, JC;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 5
265
TITLE: HIGH-GROWTH RATE A-SIH DEPOSITED BY HOT-WIRE CVD
AUTHORS: BROGUEIRA, P; CHU, V; CONDE, JP;
PUBLISHED: 1994, SOURCE: Symposium on Amorphous Silicon Technology, at the 1994 MRS Spring Meeting in AMORPHOUS SILICON TECHNOLOGY-1994, VOLUME: 336
AUTHORS: BROGUEIRA, P; CHU, V; CONDE, JP;
PUBLISHED: 1994, SOURCE: Symposium on Amorphous Silicon Technology, at the 1994 MRS Spring Meeting in AMORPHOUS SILICON TECHNOLOGY-1994, VOLUME: 336
INDEXED IN: Scopus WOS
Scopus WOS268
TITLE: Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature Full Text
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Monteiro, PA; Ferreira, JA; Chu, V; Wyrsh, N;
PUBLISHED: 1993, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 73, ISSUE: 4
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Monteiro, PA; Ferreira, JA; Chu, V; Wyrsh, N;
PUBLISHED: 1993, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 73, ISSUE: 4
270
TITLE: Deposition of amorphous silicon using a tubular reactor with concentric-electrode confinement Full Text
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Cuomo, JJ;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Cuomo, JJ;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
