421
TÍTULO: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films
AUTORES: Aguas, H ; Silva, V; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, NÚMERO: 4
INDEXADO EM: Scopus
NO MEU: ORCID
422
TÍTULO: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films
AUTORES: Aguas, H ; Silva, V; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 80, NÚMERO: 4
INDEXADO EM: WOS
423
TÍTULO: The effects of La on the dielectric properties of lead iron tungstate Pb(Fe2/3W1/3)O-3 relaxer ceramics  Full Text
AUTORES: Zhou, LQ ; Vilarinho, PM ; Mantas, PQ; Baptista, JL; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, VOLUME: 20, NÚMERO: 8
INDEXADO EM: Scopus WOS CrossRef: 28
424
TÍTULO: Towards the improvement of the stability of a-Si : H pin devices  Full Text
AUTORES: Martins, R ; Aguas, H ; Ferreira, I ; Fortunato, E ; Guimaraes, L;
PUBLICAÇÃO: 2000, FONTE: SOLAR ENERGY, VOLUME: 69, NÚMERO: 1-6
INDEXADO EM: Scopus WOS CrossRef
425
TÍTULO: Two step process for the growth of a thin layer of silicon dioxide for tunnelling effect applications
AUTORES: Aguas, H ; Cabrita, A; Tonello, P; Nunes, P; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: Symposium on Recent Developments in Oxide and Metal Epitaxy-Theory and Experiment in RECENT DEVELOPMENTS IN OXIDE AND METAL EPITAXY-THEORY AND EXPERIMENT, VOLUME: 619
INDEXADO EM: Scopus WOS
426
TÍTULO: Amorphous silicon thin films applied to photochemical sensors  Full Text
AUTORES: Fortunato, E ; Malik, A; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: 2nd European Conference on Hard Coatings (ETCHC-2)/3rd Iberian Vacuum Meeting (3rd RIVA) in VACUUM, VOLUME: 52, NÚMERO: 1-2
INDEXADO EM: Scopus WOS CrossRef
427
TÍTULO: Characteristics of a linear array of a-Si : H thin film position sensitive detector  Full Text
AUTORES: Fortunato, E ; Soares, F; Teodoro, P; Guimaraes, N; Mendes, M; Aguas, H ; Silva, V; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: THIN SOLID FILMS, VOLUME: 337, NÚMERO: 1-2
INDEXADO EM: Scopus WOS CrossRef
428
TÍTULO: Influence of the doping and annealing atmosphere on zinc oxide thin films deposited by spray pyrolysis  Full Text
AUTORES: Nunes, P; Malik, A; Fernandes, B; Fortunato, E ; Vilarinho, P ; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: 2nd European Conference on Hard Coatings (ETCHC-2)/3rd Iberian Vacuum Meeting (3rd RIVA) in VACUUM, VOLUME: 52, NÚMERO: 1-2
INDEXADO EM: Scopus WOS CrossRef: 58
429
TÍTULO: Influence of the H2 dilution and filament temperature on the properties of P doped silicon carbide thin films produced by hot-wire technique
AUTORES: Ferreira, I ; Aguas, H ; Mendes, L; Fernandes, F ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: Proceedings of the 1998 MRS Spring Meeting in Materials Research Society Symposium - Proceedings, VOLUME: 507
INDEXADO EM: Scopus
NO MEU: ORCID
430
TÍTULO: New metallurgical systems for electronic soldering applications  Full Text
AUTORES: Goncalves, C; Ferreira, J; Fortunato, E ; Ferreira, I ; Martins, R ; Marvao, AP; Martins, JI ; Harder, T; Oppelt, R;
PUBLICAÇÃO: 1999, FONTE: Symposium H - Materials Aspects in Microsystem Technologies in SENSORS AND ACTUATORS A-PHYSICAL, VOLUME: 74, NÚMERO: 1-3
INDEXADO EM: Scopus WOS
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