P. R. I. Cabarrocas
AuthID: R-006-ZKA
1
TÃTULO: Polymorphous silicon films deposited at 27.12 MHz Full Text
AUTORES: Martins, R ; Aguas, H ; Ferreira, I ; Fortunato, E ; Lebib, S; Cabarrocas, PRI; Guimaraes, L;
PUBLICAÇÃO: 2003, FONTE: CHEMICAL VAPOR DEPOSITION, VOLUME: 9, NÚMERO: 6
AUTORES: Martins, R ; Aguas, H ; Ferreira, I ; Fortunato, E ; Lebib, S; Cabarrocas, PRI; Guimaraes, L;
PUBLICAÇÃO: 2003, FONTE: CHEMICAL VAPOR DEPOSITION, VOLUME: 9, NÚMERO: 6
INDEXADO EM: WOS
2
TÃTULO: Large area deposition of polymorphous silicon by plasma enhanced chemical vapor deposition at 27.12 MHz and 13.56 MHz
AUTORES: Aguas, H ; Silva, V; Fortunato, E ; Lebib, S; Cabarrocas, PRI; Ferreira, I ; Guimaraes, L; Martins, R ;
PUBLICAÇÃO: 2003, FONTE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 42, NÚMERO: 8
AUTORES: Aguas, H ; Silva, V; Fortunato, E ; Lebib, S; Cabarrocas, PRI; Ferreira, I ; Guimaraes, L; Martins, R ;
PUBLICAÇÃO: 2003, FONTE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 42, NÚMERO: 8
INDEXADO EM: Scopus WOS
3
TÃTULO: Polymorphous silicon films produced in large area reactors by PECVD at 27.12 MHz and 13.56 MHz
AUTORES: Aguas, H ; Raniero, L; Pereira, L ; Fortunato, E ; Cabarrocas, PRI; Martins, R ;
PUBLICAÇÃO: 2003, FONTE: Symposium on Amorphous and Nanocrystalline Silicon-Based Films held at the 2003 MRS Spring Meeting in AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, VOLUME: 762
AUTORES: Aguas, H ; Raniero, L; Pereira, L ; Fortunato, E ; Cabarrocas, PRI; Martins, R ;
PUBLICAÇÃO: 2003, FONTE: Symposium on Amorphous and Nanocrystalline Silicon-Based Films held at the 2003 MRS Spring Meeting in AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, VOLUME: 762
INDEXADO EM: Scopus WOS
4
TÃTULO: Electronic transport in microcrystalline silicon controlled by trapping and intra-grain mobility Full Text
AUTORES: Vanderhaghen, R; Kasouit, S; Brenot, R; Chu, V ; Conde, JP ; Liu, F; de Martino, A; Cabarrocas, PRI;
PUBLICAÇÃO: 2002, FONTE: 19th International Conference on Amorphous and Microcrystalline Semiconductors (ICAMS 19) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 299, NÚMERO: PART 1
AUTORES: Vanderhaghen, R; Kasouit, S; Brenot, R; Chu, V ; Conde, JP ; Liu, F; de Martino, A; Cabarrocas, PRI;
PUBLICAÇÃO: 2002, FONTE: 19th International Conference on Amorphous and Microcrystalline Semiconductors (ICAMS 19) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 299, NÚMERO: PART 1