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TÍTULO: Features of the Pulsed Treatment of Silicon Layers Implanted with Erbium Ions  Full Text
AUTORES: Batalov, RI; Bayazitov, RM; Nurutdinov, RM; Kryzhkov, DI; Gaiduk, PI; Marques, CP; Alves, E ;
PUBLICAÇÃO: 2009, FONTE: JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES, VOLUME: 3, NÚMERO: 4
INDEXADO EM: Scopus WOS CrossRef