R. Venigalla
AuthID: R-00J-D43
1
TÃTULO: Optimizing stressor film deposition sequence in polish rate order for best planarization
AUTORES: Zhang, JH; Xiao, C; Strane, JW; Venigalla, R; Economikos, L; Hall, L; Chen, J; Stoll, DC; Wallner, J; Zhuang, H; Ferreira, P ; Kleemeier, W; Goldberg, C; Moon, Y; Truong, C; Sudijono, J; Chen, X; Sampson, R;
PUBLICAÇÃO: 2012, FONTE: 2011 MRS Spring Meeting in Materials Research Society Symposium Proceedings, VOLUME: 1335
AUTORES: Zhang, JH; Xiao, C; Strane, JW; Venigalla, R; Economikos, L; Hall, L; Chen, J; Stoll, DC; Wallner, J; Zhuang, H; Ferreira, P ; Kleemeier, W; Goldberg, C; Moon, Y; Truong, C; Sudijono, J; Chen, X; Sampson, R;
PUBLICAÇÃO: 2012, FONTE: 2011 MRS Spring Meeting in Materials Research Society Symposium Proceedings, VOLUME: 1335
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