Daiju Shiono
AuthID: R-00J-S8M
1
TÃTULO: Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion
AUTORES: Taku Hirayama; Daiju Shiono; Shogo Matsumaru; Toshiyuki Ogata; Hideo Hada; Junichi Onodera; Tadashi Arai; Toshio Sakamizu; Atsuko Yamaguchi; Hiroshi Shiraishi; Hiroshi Fukuda; Mitsuru Ueda;
PUBLICAÇÃO: 2005, FONTE: Advances in Resist Technology and Processing XXII
AUTORES: Taku Hirayama; Daiju Shiono; Shogo Matsumaru; Toshiyuki Ogata; Hideo Hada; Junichi Onodera; Tadashi Arai; Toshio Sakamizu; Atsuko Yamaguchi; Hiroshi Shiraishi; Hiroshi Fukuda; Mitsuru Ueda;
PUBLICAÇÃO: 2005, FONTE: Advances in Resist Technology and Processing XXII
