Process Monitoring During Alnxoy Deposition by Reactive Magnetron Sputtering and Correlation with the Film's Properties

AuthID
 P-009-5EZ
4
Author(s)
Tipo de Documento
Article
Year published
2014
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 32, Número: 2, Páginas: 021307 (10)
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Publication Identifiers
SCOPUS: 2-s2.0-84894024580
Wos: WOS:000335964200039
Source Identifiers
ISSN: 0734-2101
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