João Pedro Estrela Rodrigues Conde
AuthID: R-000-7DS
261
TITLE: Low filament temperature deposition of a-Si:H by hot-wire chemical vapor deposition Full Text
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
262
TITLE: Transport and photoluminescence of hydrogenated amorphous silicon–carbon alloys Full Text
AUTHORS: Chu, V; Conde, JP; Jarego, J; Brogueira, P; Rodriguez, J; Barradas, N; Soares, JC;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 5
AUTHORS: Chu, V; Conde, JP; Jarego, J; Brogueira, P; Rodriguez, J; Barradas, N; Soares, JC;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 5
263
TITLE: HIGH-GROWTH RATE A-SIH DEPOSITED BY HOT-WIRE CVD
AUTHORS: BROGUEIRA, P; CHU, V; CONDE, JP;
PUBLISHED: 1994, SOURCE: Symposium on Amorphous Silicon Technology, at the 1994 MRS Spring Meeting in AMORPHOUS SILICON TECHNOLOGY-1994, VOLUME: 336
AUTHORS: BROGUEIRA, P; CHU, V; CONDE, JP;
PUBLISHED: 1994, SOURCE: Symposium on Amorphous Silicon Technology, at the 1994 MRS Spring Meeting in AMORPHOUS SILICON TECHNOLOGY-1994, VOLUME: 336
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Scopus WOS266
TITLE: Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature Full Text
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Monteiro, PA; Ferreira, JA; Chu, V; Wyrsh, N;
PUBLISHED: 1993, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 73, ISSUE: 4
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Monteiro, PA; Ferreira, JA; Chu, V; Wyrsh, N;
PUBLISHED: 1993, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 73, ISSUE: 4
268
TITLE: Deposition of amorphous silicon using a tubular reactor with concentric-electrode confinement Full Text
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Cuomo, JJ;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M; Cuomo, JJ;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
269
TITLE: The effect of the flow of silane on the properties of a-Si:H deposited by concentric-electrode radio frequency glow-discharge Full Text
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
AUTHORS: Conde, JP; Chan, KK; Blum, JM; Arienzo, M;
PUBLISHED: 1992, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 71, ISSUE: 8
270
TITLE: Optoelectronic properties of hydrogenated amorphous silicon films deposited under negative substrate bias Full Text
AUTHORS: Roca i Cabarrocas, P; Morin, P; Chu, V; Conde, JP; Liu, JZ; Park, HR; Wagner, S;
PUBLISHED: 1991, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 69, ISSUE: 5
AUTHORS: Roca i Cabarrocas, P; Morin, P; Chu, V; Conde, JP; Liu, JZ; Park, HR; Wagner, S;
PUBLISHED: 1991, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 69, ISSUE: 5
