Elvira Maria Correia Fortunato


AuthID: R-000-4M5

Publicações Confirmadas: 508



411
TÍTULO: New ultra-light flexible large area thin film position sensitive detector based on amorphous silicon
AUTORES: Fortunate, E ; Ferreira, I ; Giuliani, F; Wurmsdobler, P; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: Journal of Non-Crystalline Solids, VOLUME: 266-269 B
INDEXADO EM: Scopus
412
TÍTULO: Performances of an optical ruler based on one-dimensional hydrogenated amorphous Si position-sensitive detectors produced using different metal contacts  Full Text
AUTORES: Fortunato, E ; Teodoro, P; Silva, V; Ferreira, I ; Nunes, Y ; Guimaraes, N; Soares, F; Giuliani, F; Popovic, G; Brener, W; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, NÚMERO: 4
INDEXADO EM: Scopus CrossRef
NO MEU: ORCID
413
TÍTULO: Performances of an optical ruler based on one-dimensional hydrogenated amorphous Si position-sensitive detectors produced using different metal contacts  Full Text
AUTORES: Fortunato, E ; Teodoro, P; Silva, V; Ferreira, I ; Nunes, Y ; Guimaraes, N; Soares, F; Giuliani, F; Popovic, G; Brener, W; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 80, NÚMERO: 4
INDEXADO EM: WOS CrossRef
NO MEU: ORCID | ResearcherID
414
TÍTULO: Plasma diagnostics of a PECVD system using different RF electrode configurations  Full Text
AUTORES: Aguas, H ; Martins, R ; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-MRS Spring Meeting in VACUUM, VOLUME: 56, NÚMERO: 1
INDEXADO EM: Scopus WOS
NO MEU: ORCID | ResearcherID
415
TÍTULO: Production of low cost contacts and joins for large area devices by electrodeposition of Cu and Sn  Full Text
AUTORES: Ferreira, J; Seiroco, H; Fernandes, FB ; Martins, R ; Fortunato, E ; Marvao, AP; Martins, JI ;
PUBLICAÇÃO: 2000, FONTE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 168, NÚMERO: 1-4
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID | ResearcherID
416
TÍTULO: Role of ion bombardment on the properties of a-Si : H films
AUTORES: Aguas, H ; Martins, R ; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Vacuum, VOLUME: 60, NÚMERO: 1-2
INDEXADO EM: Scopus
NO MEU: ORCID
417
TÍTULO: Role of soldering parameters on the electrical performances presented by Cu-Sn-Cu joints used in power diodes  Full Text
AUTORES: Martins, R ; Ferreira, J; Goncalves, C; Nunes, P; Fortunato, E ; Marvao, AP; Martins, JI ;
PUBLICAÇÃO: 2000, FONTE: Joint FEMS Symposium/E-MRS Symposium H Strain in Materials: Analysis, Relatation and Properties in MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, VOLUME: 288, NÚMERO: 2
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID | ResearcherID
418
TÍTULO: Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique  Full Text
AUTORES: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-MRS Spring Meeting in VACUUM, VOLUME: 56, NÚMERO: 1
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID | ResearcherID
419
TÍTULO: Role of the gas temperature and power to gas flow ratio on powder formation and properties of films grown by the PECVD technique  Full Text
AUTORES: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Spring Meeting of the European-Materials-Research-Society in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, VOLUME: 69
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID | ResearcherID
420
TÍTULO: Silicon films produced by PECVD under powder formation conditions
AUTORES: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
INDEXADO EM: WOS
NO MEU: ResearcherID
Página 42 de 51. Total de resultados: 508.

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