141
TÍTULO: Performances of an optical ruler based on one-dimensional hydrogenated amorphous Si position-sensitive detectors produced using different metal contacts  Full Text
AUTORES: Fortunato, E ; Teodoro, P; Silva, V; Ferreira, I ; Nunes, Y ; Guimaraes, N; Soares, F; Giuliani, F; Popovic, G; Brener, W; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, NÚMERO: 4
INDEXADO EM: Scopus CrossRef
NO MEU: ORCID
142
TÍTULO: Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique  Full Text
AUTORES: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-MRS Spring Meeting in VACUUM, VOLUME: 56, NÚMERO: 1
INDEXADO EM: Scopus WOS CrossRef
143
TÍTULO: Role of the gas temperature and power to gas flow ratio on powder formation and properties of films grown by the PECVD technique  Full Text
AUTORES: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: Spring Meeting of the European-Materials-Research-Society in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, VOLUME: 69
INDEXADO EM: Scopus WOS CrossRef
144
TÍTULO: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films
AUTORES: Aguas, H ; Silva, V; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, NÚMERO: 4
INDEXADO EM: Scopus
NO MEU: ORCID
145
TÍTULO: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films
AUTORES: Aguas, H ; Silva, V; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: International Workshop on Semiconducting and Superconducting Materials in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 80, NÚMERO: 4
INDEXADO EM: WOS
146
TÍTULO: Towards the improvement of the stability of a-Si : H pin devices  Full Text
AUTORES: Martins, R ; Aguas, H ; Ferreira, I ; Fortunato, E ; Guimaraes, L;
PUBLICAÇÃO: 2000, FONTE: SOLAR ENERGY, VOLUME: 69, NÚMERO: 1-6
INDEXADO EM: Scopus WOS CrossRef
147
TÍTULO: Influence of the H2 dilution and filament temperature on the properties of P doped silicon carbide thin films produced by hot-wire technique
AUTORES: Ferreira, I ; Aguas, H ; Mendes, L; Fernandes, F ; Fortunato, E ; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: Proceedings of the 1998 MRS Spring Meeting in Materials Research Society Symposium - Proceedings, VOLUME: 507
INDEXADO EM: Scopus
NO MEU: ORCID
148
TÍTULO: Nanocrystalline silicon carbon doped films prepared by hot wire technique  Full Text
AUTORES: Ferreira, I ; Fernandes, B; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: 2nd European Conference on Hard Coatings (ETCHC-2)/3rd Iberian Vacuum Meeting (3rd RIVA) in VACUUM, VOLUME: 52, NÚMERO: 1-2
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID
149
TÍTULO: New metallurgical systems for electronic soldering applications  Full Text
AUTORES: Goncalves, C; Ferreira, J; Fortunato, E ; Ferreira, I ; Martins, R ; Marvao, AP; Martins, JI ; Harder, T; Oppelt, R;
PUBLICAÇÃO: 1999, FONTE: Symposium H - Materials Aspects in Microsystem Technologies in SENSORS AND ACTUATORS A-PHYSICAL, VOLUME: 74, NÚMERO: 1-3
INDEXADO EM: Scopus WOS
NO MEU: ORCID
150
TÍTULO: Performances of a-Si : H films produced by hot wire plasma assisted technique  Full Text
AUTORES: Martins, R ; Ferreira, I ; Fernandes, B; Fortunato, E ;
PUBLICAÇÃO: 1999, FONTE: 2nd European Conference on Hard Coatings (ETCHC-2)/3rd Iberian Vacuum Meeting (3rd RIVA) in VACUUM, VOLUME: 52, NÚMERO: 1-2
INDEXADO EM: Scopus WOS CrossRef
NO MEU: ORCID
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