H. S. Reehal
AuthID: R-006-NTZ
1
TÃTULO: Growth of microcrystalline beta-SiC films on silicon by ECR plasma CVD Full Text
AUTORES: Toal, SJ; Reehal, HS; Barradas, NP ; Jeynes, C;
PUBLICAÇÃO: 1999, FONTE: Symposium on Surface Processing - Laser, Lamp, Plasma, at the Annual Spring Meeting of the European-Materials-Society (E-MRS 96) in APPLIED SURFACE SCIENCE, VOLUME: 138, NÚMERO: 1-4
AUTORES: Toal, SJ; Reehal, HS; Barradas, NP ; Jeynes, C;
PUBLICAÇÃO: 1999, FONTE: Symposium on Surface Processing - Laser, Lamp, Plasma, at the Annual Spring Meeting of the European-Materials-Society (E-MRS 96) in APPLIED SURFACE SCIENCE, VOLUME: 138, NÚMERO: 1-4
2
TÃTULO: Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD Full Text
AUTORES: Toal, SJ; Reehal, HS; Webb, SJ; Barradas, NP ; Jeynes, C;
PUBLICAÇÃO: 1999, FONTE: 14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis in THIN SOLID FILMS, VOLUME: 343, NÚMERO: 1-2
AUTORES: Toal, SJ; Reehal, HS; Webb, SJ; Barradas, NP ; Jeynes, C;
PUBLICAÇÃO: 1999, FONTE: 14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis in THIN SOLID FILMS, VOLUME: 343, NÚMERO: 1-2
