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152

TÃTULO: Role of the hot wire filament temperature on the structure and morphology of the nanocrystalline silicon p-doped films Full Text
AUTORES: Ferreira, I ; Aguas, H ; Mendes, L; Martins, R ;
PUBLICAÇÃO: 1999, FONTE: 14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis in APPLIED SURFACE SCIENCE, VOLUME: 144-45

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153

TÃTULO: Amorphous silicon sensors: from photo to chemical detection Full Text
AUTORES: Fortunato, E ; Malik, A; Seco, A; Ferreira, I ; Martins, R ;
PUBLICAÇÃO: 1998, FONTE: 17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 227, NÚMERO: PART 2

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154

TÃTULO: Investigation of the amorphous to microcrystalline phase transition of thin film silicon produced by PECVD Full Text
AUTORES: Martins, R ; Macarico, A; Ferreira, I ; Nunes, R; Bicho, A; Fortunato, E ;
PUBLICAÇÃO: 1998, FONTE: 5th European Vacuum Conference (EVC 5) / 10th International Conference on Thin Films (ICTF 10) in THIN SOLID FILMS, VOLUME: 317, NÚMERO: 1-2

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155

TÃTULO: Role of the deposition conditions on the properties presented by nanocrystallite silicon films produced by hot wire Full Text
AUTORES: Martins, R ; Ferreira, I ; Fernandes, F ; Fortunato, E ;
PUBLICAÇÃO: 1998, FONTE: 17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 227, NÚMERO: PART 2

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156

TÃTULO: Undoped and doped crystalline silicon films obtained by Nd-YAG laser Full Text
AUTORES: Ferreira, I ; Carvalho, J; Martins, R ;
PUBLICAÇÃO: 1998, FONTE: 5th European Vacuum Conference (EVC 5) / 10th International Conference on Thin Films (ICTF 10) in THIN SOLID FILMS, VOLUME: 317, NÚMERO: 1-2

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157

TÃTULO: Highly conductive and highly transparent n-type microcrystalline silicon thin films Full Text
AUTORES: Martins, R ; Macarico, A; Ferreira, I ; Nunes, R; Bicho, A; Fortunato, E ;
PUBLICAÇÃO: 1997, FONTE: THIN SOLID FILMS, VOLUME: 303, NÚMERO: 1-2

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158

TÃTULO: Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique
AUTORES: Martins, R ; Macarico, A; Ferreira, I ; Fidalgo, J; Fortunato, E ;
PUBLICAÇÃO: 1997, FONTE: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 76, NÚMERO: 3

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159

TÃTULO: Role of the gas flow parameters on the uniformity of films produced by PECVD technique
AUTORES: Martins, R ; Macarico, A; Ferreira, I ; Fortunato, E ;
PUBLICAÇÃO: 1997, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, VOLUME: 467

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160

TÃTULO: Structure, composition and electro-optical properties of n-type amorphous and microcrystalline silicon thin films
AUTORES: Martins, R ; Macarico, A; Vieira, M ; Ferreira, I ; Fortunato, E ;
PUBLICAÇÃO: 1997, FONTE: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 76, NÚMERO: 3

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