Erwan Rauwel
AuthID: R-000-4PA
1
TÃTULO: Oxygen Diffusion Barrier Applied To High-k Thin Films Deposition
AUTORES: Rauwel, E; Rauwel, P; Ducroquet, F; Matko, I; Lourenco, A;
PUBLICAÇÃO: 2010, FONTE: 8th International Symposium on High Dielectric Constant and Other Dielectric Materials for Nanoelectronics and Photonice Held During the 218th Meeting of the Electrochemical-Society (ECS) in PHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 8, VOLUME: 33, NÚMERO: 3
AUTORES: Rauwel, E; Rauwel, P; Ducroquet, F; Matko, I; Lourenco, A;
PUBLICAÇÃO: 2010, FONTE: 8th International Symposium on High Dielectric Constant and Other Dielectric Materials for Nanoelectronics and Photonice Held During the 218th Meeting of the Electrochemical-Society (ECS) in PHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 8, VOLUME: 33, NÚMERO: 3
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TÃTULO: A novel approach for the preparation of metal oxide/CNTs composites for sensing applications
AUTORES: Neri, G; Bonavita, A; Micali, G; Rizzo, G; Willinger, MG; Rauwel, E; Pinna, N;
PUBLICAÇÃO: 2010, FONTE: 14th Italian Conference on Sensors and Microsystems, AISEM 2009 in Lecture Notes in Electrical Engineering, VOLUME: 54 LNEE
AUTORES: Neri, G; Bonavita, A; Micali, G; Rizzo, G; Willinger, MG; Rauwel, E; Pinna, N;
PUBLICAÇÃO: 2010, FONTE: 14th Italian Conference on Sensors and Microsystems, AISEM 2009 in Lecture Notes in Electrical Engineering, VOLUME: 54 LNEE
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TÃTULO: A radical approach to promote multiferroic coupling in double perovskites Full Text
AUTORES: Singh, MP; Truong, KD; Fournier, P; Rauwel, P; Rauwel, E; Carignan, LP; Menard, D;
PUBLICAÇÃO: 2009, FONTE: Symposium on Multiferroics and Magnetoelectrics Materials held at the 2008 EMRS Spring Conference in JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, VOLUME: 321, NÚMERO: 11
AUTORES: Singh, MP; Truong, KD; Fournier, P; Rauwel, P; Rauwel, E; Carignan, LP; Menard, D;
PUBLICAÇÃO: 2009, FONTE: Symposium on Multiferroics and Magnetoelectrics Materials held at the 2008 EMRS Spring Conference in JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, VOLUME: 321, NÚMERO: 11
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TÃTULO: Non-aqueous sol-gel routes applied to atomic layer deposition of oxides
AUTORES: Guylhaine Clavel; Erwan Rauwel; Marc Georg Willinger; Nicola Pinna;
PUBLICAÇÃO: 2009, FONTE: JOURNAL OF MATERIALS CHEMISTRY, VOLUME: 19, NÚMERO: 4
AUTORES: Guylhaine Clavel; Erwan Rauwel; Marc Georg Willinger; Nicola Pinna;
PUBLICAÇÃO: 2009, FONTE: JOURNAL OF MATERIALS CHEMISTRY, VOLUME: 19, NÚMERO: 4
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TÃTULO: Effect of annealing and electrical properties of high-kappa thin films grown by atomic layer deposition using carboxylic acids as oxygen source
AUTORES: Rauwel, E; Ducroquet, F; Rauwel, P; G Willinger; Matko, I; Pinna, N;
PUBLICAÇÃO: 2009, FONTE: 15th Workshop on Dielectrics in Microelectronics (WoDiM 2008) in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, VOLUME: 27, NÚMERO: 1
AUTORES: Rauwel, E; Ducroquet, F; Rauwel, P; G Willinger; Matko, I; Pinna, N;
PUBLICAÇÃO: 2009, FONTE: 15th Workshop on Dielectrics in Microelectronics (WoDiM 2008) in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, VOLUME: 27, NÚMERO: 1
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TÃTULO: The controlled deposition of metal oxides onto carbon nanotubes by atomic layer deposition: examples and a case study on the application of V2O4 coated nanotubes in gas sensing Full Text
AUTORES: Marc Georg Willinger; Giovanni Neri; Anna Bonavita; Giuseppe Micali; Erwan Rauwel; Tobias Herntrich; Nicola Pinna;
PUBLICAÇÃO: 2009, FONTE: PHYSICAL CHEMISTRY CHEMICAL PHYSICS, VOLUME: 11, NÚMERO: 19
AUTORES: Marc Georg Willinger; Giovanni Neri; Anna Bonavita; Giuseppe Micali; Erwan Rauwel; Tobias Herntrich; Nicola Pinna;
PUBLICAÇÃO: 2009, FONTE: PHYSICAL CHEMISTRY CHEMICAL PHYSICS, VOLUME: 11, NÚMERO: 19
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TÃTULO: Vanadium Oxide Sensing Layer Grown on Carbon Nanotubes by a New Atomic Layer Deposition Process Full Text
AUTORES: Marc Georg Willinger; Giovanni Neri; Erwan Rauwel; Anna Bonavita; Giuseppe Micali; Nicola Pinna;
PUBLICAÇÃO: 2008, FONTE: NANO LETTERS, VOLUME: 8, NÚMERO: 12
AUTORES: Marc Georg Willinger; Giovanni Neri; Erwan Rauwel; Anna Bonavita; Giuseppe Micali; Nicola Pinna;
PUBLICAÇÃO: 2008, FONTE: NANO LETTERS, VOLUME: 8, NÚMERO: 12
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TÃTULO: Carboxylic acids as oxygen sources for the atomic layer deposition of high-kappa metal oxides
AUTORES: Erwan Rauwel; Marc Georg Willinger; Frederique Ducroquet; Protima Rauwel; Igor Matko; Dmitry Kiselev; Nicola Pinna;
PUBLICAÇÃO: 2008, FONTE: JOURNAL OF PHYSICAL CHEMISTRY C, VOLUME: 112, NÚMERO: 33
AUTORES: Erwan Rauwel; Marc Georg Willinger; Frederique Ducroquet; Protima Rauwel; Igor Matko; Dmitry Kiselev; Nicola Pinna;
PUBLICAÇÃO: 2008, FONTE: JOURNAL OF PHYSICAL CHEMISTRY C, VOLUME: 112, NÚMERO: 33
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TÃTULO: Anomalously large ferromagnetic Curie temperature of epitaxial Bi(2)CoMnO(6) thin films Full Text
AUTORES: Singh, MP; Truong, KD; Fournier, P; Rauwel, P; Rauwel, E; Carignan, LP; Menard, D;
PUBLICAÇÃO: 2008, FONTE: APPLIED PHYSICS LETTERS, VOLUME: 92, NÚMERO: 11
AUTORES: Singh, MP; Truong, KD; Fournier, P; Rauwel, P; Rauwel, E; Carignan, LP; Menard, D;
PUBLICAÇÃO: 2008, FONTE: APPLIED PHYSICS LETTERS, VOLUME: 92, NÚMERO: 11
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TÃTULO: Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-kappa Thin Films
AUTORES: Rauwel, E; Ducroquet, F; Rauwel, P; G Willinger; Matko, I; Kiselev, D; Pinna, N;
PUBLICAÇÃO: 2008, FONTE: 4th Symposium on Atomic Layer Deposition Applications held at the 214th Meeting of the Electrochemical-Society in ATOMIC LAYER DEPOSITION APPLICATIONS 4, VOLUME: 16, NÚMERO: 4
AUTORES: Rauwel, E; Ducroquet, F; Rauwel, P; G Willinger; Matko, I; Kiselev, D; Pinna, N;
PUBLICAÇÃO: 2008, FONTE: 4th Symposium on Atomic Layer Deposition Applications held at the 214th Meeting of the Electrochemical-Society in ATOMIC LAYER DEPOSITION APPLICATIONS 4, VOLUME: 16, NÚMERO: 4
